| ชื่อเรื่อง | : | Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist |
| นักวิจัย | : | Tobing, Landobasa Yosef Mario A. L. , Tjahjana, Liliana , Zhang, Dao Hua |
| คำค้น | : | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2555 |
| อ้างอิง | : | Tobing, L. Y. M. A. L., Tjahjana, L., & Zhang, D. H. (2012). Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist. Journal of vacuum science & technology B : microelectronics and nanometer structures, 30(5), 051601-. , 2166-2746 , http://hdl.handle.net/10220/17831 , http://dx.doi.org/10.1116/1.4739053 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | Journal of vacuum science & technology B: microelectronics and nanometer structures |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | The authors demonstrate a robust, low dose, high contrast, and ultrahigh resolution patterning process based on sonication assisted development of ZEP520A positive tone resist in both room and cold temperature. The contrast as high as γ ∼ 25 and γ ∼ 9.14 can readily be achieved in 6 °C and room temperature development, respectively, in diluted n-amyl acetate solution. The high contrast is demonstrated on 90 nm thick ZEP resist at 20 kV acceleration voltage, from which 20 nm thick titanium lift-off of 60 nm pitch lines and 50 nm pitch dots can be successfully achieved. |
| บรรณานุกรม | : |
Tobing, Landobasa Yosef Mario A. L. , Tjahjana, Liliana , Zhang, Dao Hua . (2555). Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist.
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Tobing, Landobasa Yosef Mario A. L. , Tjahjana, Liliana , Zhang, Dao Hua . 2555. "Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Tobing, Landobasa Yosef Mario A. L. , Tjahjana, Liliana , Zhang, Dao Hua . "Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2555. Print. Tobing, Landobasa Yosef Mario A. L. , Tjahjana, Liliana , Zhang, Dao Hua . Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2555.
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