| ชื่อเรื่อง | : | Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference. |
| นักวิจัย | : | Sidharthan Raghuraman. , Murukeshan, V. M. , Sathiyamoorthy, K. |
| คำค้น | : | DRNTU::Engineering::Mechanical engineering. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2555 |
| อ้างอิง | : | Sidharthan, R., Murukeshan, V. M., & Sathiyamoorthy, K. (2012). Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference. Journal of nanoscience and nanotechnology, 12(8), 6428-6431. , http://hdl.handle.net/10220/13729 , http://dx.doi.org/10.1166/jnn.2012.6453 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | Journal of nanoscience and nanotechnology |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939. |
| บรรณานุกรม | : |
Sidharthan Raghuraman. , Murukeshan, V. M. , Sathiyamoorthy, K. . (2555). Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference..
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Sidharthan Raghuraman. , Murukeshan, V. M. , Sathiyamoorthy, K. . 2555. "Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference.".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Sidharthan Raghuraman. , Murukeshan, V. M. , Sathiyamoorthy, K. . "Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference.."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2555. Print. Sidharthan Raghuraman. , Murukeshan, V. M. , Sathiyamoorthy, K. . Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference.. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2555.
|
