| ชื่อเรื่อง | : | Formation and characterization of magnetron sputtered Ta–Si–N–O thin films. |
| นักวิจัย | : | Yan, H. , Li, L. , Ho, F. Y. , Liang, M. H. , Pan, J. S. , Xu, S. , Chen, Z. |
| คำค้น | : | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2552 |
| อ้างอิง | : | Yan, H., Li, L., Ho, F. Y., Liang, M. H., Pan, J. S., Xu, S., & Chen, Z. (2009). Formation and characterization of magnetron sputtered Ta-Si-N-O thin films. Thin Solid Films, 517(17), 5207-5211. , http://hdl.handle.net/10220/8204 , http://dx.doi.org/10.1016/j.tsf.2009.03.057 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | Thin solid films |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | Tantalum silicon nitride films have good potential to be used as hard coatings and diffusion barriers. In this work, films with different composition were deposited using a magnetron sputter under varying nitrogen flow rates. The composition, microstructure, thermal stability and electrical resistivity have been investigated. In the as-deposited state, all films consist of amorphous TaSixOy, TaxOy, TaxNy and TaSix compounds. The composition of films is affected by N2 flow rate. The resistivity of the as-deposited films increases with N concentrations. At elevated temperatures, all films show good thermal stability to at least 800 °C, while film with high Si concentration is largely amorphous at 900 °C because of highly stable TaSixOy compounds. This study suggests that the TaSixOy compounds could be the key factor in enhancing thermal stability of Ta–Si–N–O films. |
| บรรณานุกรม | : |
Yan, H. , Li, L. , Ho, F. Y. , Liang, M. H. , Pan, J. S. , Xu, S. , Chen, Z. . (2552). Formation and characterization of magnetron sputtered Ta–Si–N–O thin films..
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Yan, H. , Li, L. , Ho, F. Y. , Liang, M. H. , Pan, J. S. , Xu, S. , Chen, Z. . 2552. "Formation and characterization of magnetron sputtered Ta–Si–N–O thin films.".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Yan, H. , Li, L. , Ho, F. Y. , Liang, M. H. , Pan, J. S. , Xu, S. , Chen, Z. . "Formation and characterization of magnetron sputtered Ta–Si–N–O thin films.."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2552. Print. Yan, H. , Li, L. , Ho, F. Y. , Liang, M. H. , Pan, J. S. , Xu, S. , Chen, Z. . Formation and characterization of magnetron sputtered Ta–Si–N–O thin films.. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2552.
|
ridm@nrct.go.th ระบบคลังข้อมูลงานวิจัยไทย รายการโปรดที่คุณเลือกไว้
