Titanium dioxide (TiO2) films were prepared on glass substrates without external heating by DC magnetron reactive sputtering. Argon and oxygen were used as sputtering and reactive gases, respectively. Initially TiO 2 films were produced under a constant discharge power of 300W, total operated pressure of 1.10 Pa, the Ar:O2 flow rate of 50:45 sccm and film thickness of 300 nm. After deposition, the films were annealed in air and in vacuum (8×10-1 Pa) at a temperature of 350 °C and an annealed time of 2 hours. Films structure, optical properties, photocatalytic activity (methylene blue degradation) and photo-induced hydrophilicity properties were mainly investigated to produce self-cleaning surface. Because of higher crystallinity of vacuum-annealed films lead to the highest MB degradation under UV irradiation. While, air-annealed films showed lower MB degradation than as-deposited films that could be affected of contamination on surface and defect from annealing. Vacuum-annealed films showed changes of water contact angle on the films surface higher than as-deposited films and air annealed- films. © (2010) Trans Tech Publications.