| ชื่อเรื่อง | : | Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes |
| นักวิจัย | : | Tan, Cher Ming , Fu, Chunmiao |
| คำค้น | : | DRNTU::Engineering::Electrical and electronic engineering. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2555 |
| อ้างอิง | : | Tan, C. M., & Fu, C. (2012). Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes. 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology (ICSICT), pp.1-4. , http://hdl.handle.net/10220/16310 , http://dx.doi.org/10.1109/ICSICT.2012.6467816 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | - |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | Reservoir length in ULSI interconnections can enhance their electromigration lifetime. As low-K dielectric is employed in current technology node, and line current density and temperature increase as we advanced in technology node, we investigate the impact of the above-mentioned on the effectiveness of reservoir length. We found that current density has no impact at all, but higher line temperature improves the effectiveness. As for the low-K dielectric used, most of them do not affect the effectiveness except CDO which degrade its effectiveness. In all cases, the saturation length where the enhancement ceases remain at around 50 nm, and it is not affected by the above-mentioned parameters. |
| บรรณานุกรม | : |
Tan, Cher Ming , Fu, Chunmiao . (2555). Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes.
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Tan, Cher Ming , Fu, Chunmiao . 2555. "Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Tan, Cher Ming , Fu, Chunmiao . "Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2555. Print. Tan, Cher Ming , Fu, Chunmiao . Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2555.
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