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Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy

หน่วยงาน Nanyang Technological University, Singapore

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ชื่อเรื่อง : Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy
นักวิจัย : He, Yingran , Ong, Hock Guan , Zhao, Yang , He, Sailing , Li, Lain-Jong , Wang, Junling
คำค้น : DRNTU::Engineering::Materials::Nanostructured materials.
หน่วยงาน : Nanyang Technological University, Singapore
ผู้ร่วมงาน : -
ปีพิมพ์ : 2552
อ้างอิง : He, Y., Ong, H. G., Zhao, Y., He, S., Li, L. J., & Wang, J. (2009). Study of Charge Diffusion at the Carbon Nanotube-SiO2 Interface by Electrostatic Force Microscopy. Journal of Physical Chemistry C, 113(35), 15476-15479. , http://hdl.handle.net/10220/7418 , http://dx.doi.org/10.1021/jp905779f
ที่มา : -
ความเชี่ยวชาญ : -
ความสัมพันธ์ : Journal of physical chemistry C
ขอบเขตของเนื้อหา : -
บทคัดย่อ/คำอธิบาย :

Hysteresis behavior is observed in the transfer characteristic of most carbon-nanotube-based field effect transistors, and charges trapped at the carbon nanotube−dielectric interface are believed to be the cause. We have studied charge injection and dissipation around the interface of carbon nanotubes and SiO2 at different temperatures using an electrostatic force microscope. Numerical simulations were performed to extract the charge diffusion coefficients on the SiO2 surface under ambient conditions at different temperatures, and a critical temperature of 150 °C is observed. The activation energy of charge diffusion changes from 0.43 to 0.98 eV above this temperature, which is attributed to the change of surface chemistry. A more accurate model taking into consideration the electrostatic interaction among charges is used subsequently, and the fitting results are significantly improved. It is noted that the two models lead to similar activation energies.

บรรณานุกรม :
He, Yingran , Ong, Hock Guan , Zhao, Yang , He, Sailing , Li, Lain-Jong , Wang, Junling . (2552). Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy.
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
He, Yingran , Ong, Hock Guan , Zhao, Yang , He, Sailing , Li, Lain-Jong , Wang, Junling . 2552. "Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy".
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
He, Yingran , Ong, Hock Guan , Zhao, Yang , He, Sailing , Li, Lain-Jong , Wang, Junling . "Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy."
    กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2552. Print.
He, Yingran , Ong, Hock Guan , Zhao, Yang , He, Sailing , Li, Lain-Jong , Wang, Junling . Study of charge diffusion at the carbon nanotube-SiO2 interface by electrostatic force microscopy. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2552.