| ชื่อเรื่อง | : | Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application |
| นักวิจัย | : | Yuan, C. L. , Darmawan, P. , Setiawan, Y. , Lee, Pooi See , Ma, Jan |
| คำค้น | : | DRNTU::Engineering::Materials. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2549 |
| อ้างอิง | : | Yuan, C. L., Darmawan, P., Setiawan, Y., Lee, P. S., & Ma, J. (2006). Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application. Applied Physics Letters, 89(4). , http://hdl.handle.net/10220/8013 , http://dx.doi.org/10.1063/1.2234302 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | Applied physics letters |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | We have developed a method based upon pulsed laser deposition to produce SrTiO3 nanocrystals embedded in amorphous Lu2O3 high-k dielectric. The high resolution transmission electron microscopy study revealed the complete isolation of SrTiO3 nanocrystals embedded in Lu2O3 matrix with 4 nm diameter and well distributed with an area density estimated to be about 8x 10^11 cm−2. A pronounced capacitance-voltage hysteresis is observed with a memory window of ~1.5 V under the 6 V programming. In addition, the retention characteristics are tested to be robust. |
| บรรณานุกรม | : |
Yuan, C. L. , Darmawan, P. , Setiawan, Y. , Lee, Pooi See , Ma, Jan . (2549). Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application.
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Yuan, C. L. , Darmawan, P. , Setiawan, Y. , Lee, Pooi See , Ma, Jan . 2549. "Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Yuan, C. L. , Darmawan, P. , Setiawan, Y. , Lee, Pooi See , Ma, Jan . "Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2549. Print. Yuan, C. L. , Darmawan, P. , Setiawan, Y. , Lee, Pooi See , Ma, Jan . Formation of SrTiO3 nanocrystals in amorphous Lu2O3 high-k gate dielectric for floating gate memory application. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2549.
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