| ชื่อเรื่อง | : | Sensitivity analysis of coupled interconnects for RFIC applications |
| นักวิจัย | : | Shi, Xiaomeng , Yeo, Kiat Seng , Ma, Jianguo , Do, Manh Anh , Li, Erping |
| คำค้น | : | DRNTU::Engineering::Electrical and electronic engineering. |
| หน่วยงาน | : | Nanyang Technological University, Singapore |
| ผู้ร่วมงาน | : | - |
| ปีพิมพ์ | : | 2549 |
| อ้างอิง | : | Shi, X., Yeo, K. S., Ma, J. G., Do, M. A., & Li, E. (2006). Sensitivity analysis of coupled interconnects for RFIC applications. IEEE Transactions on Electromagnetic Compatibility, 48(4), 607-613. , 0018-9375 , http://hdl.handle.net/10220/4665 , http://dx.doi.org/10.1109/TEMC.2006.884417 |
| ที่มา | : | - |
| ความเชี่ยวชาญ | : | - |
| ความสัมพันธ์ | : | IEEE transactions on electromagnetic compatibility |
| ขอบเขตของเนื้อหา | : | - |
| บทคัดย่อ/คำอธิบาย | : | This paper investigates the sensitivity of on-wafer coupled interconnects to the Si CMOS process parameters. Experiments are conducted to emulate state-of-the-art and future technologies. Some important parameters characterizing the coupled interconnects have been examined. The influence of the process parameters on transmission, reflection, near-end, and far-end crosstalk capacities of the coupled interconnects are discussed. |
| บรรณานุกรม | : |
Shi, Xiaomeng , Yeo, Kiat Seng , Ma, Jianguo , Do, Manh Anh , Li, Erping . (2549). Sensitivity analysis of coupled interconnects for RFIC applications.
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Shi, Xiaomeng , Yeo, Kiat Seng , Ma, Jianguo , Do, Manh Anh , Li, Erping . 2549. "Sensitivity analysis of coupled interconnects for RFIC applications".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Shi, Xiaomeng , Yeo, Kiat Seng , Ma, Jianguo , Do, Manh Anh , Li, Erping . "Sensitivity analysis of coupled interconnects for RFIC applications."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2549. Print. Shi, Xiaomeng , Yeo, Kiat Seng , Ma, Jianguo , Do, Manh Anh , Li, Erping . Sensitivity analysis of coupled interconnects for RFIC applications. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2549.
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